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Structural properties of CoPt films patterned using ion irradiation

Identifieur interne : 000868 ( Main/Exploration ); précédent : 000867; suivant : 000869

Structural properties of CoPt films patterned using ion irradiation

Auteurs : M. Abes [France] ; J. Venuat [France] ; D. Muller [France] ; A. Carvalho [France] ; G. Schmerber [France] ; E. Beaurepaire [France] ; A. Dinia [France] ; V. Pierron-Bohnes [France]

Source :

RBID : Pascal:06-0371435

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English descriptors

Abstract

Patterned CoPt films were fabricated using a combination of e-beam lithography and He+ ion irradiation to produce a planar array of ordered CoPt squares separated by disordered CoPt areas: (i) by molecular beam epitaxy was deposited a CoPt ordered film which corresponds to a "natural" multilayer: alternating pure cobalt and pure platinum (0 0 1) planes. (ii) The film was covered by a 300 nm thick Pt layer mask. (iii) Irradiation with appropriate ion beam and fluence disorders the CoPt film where not protected by the mask. X-ray diffraction, as well as atomic and magnetic force microscopy, is used to characterise the structural and magnetic changes in the film. The He+ ion irradiation does not significantly modify the surface of the CoPt film: the roughness almost remains identical (∼2 nm). This is promising for applications in magnetic recording technologies.


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Le document en format XML

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<div type="abstract" xml:lang="en">Patterned CoPt films were fabricated using a combination of e-beam lithography and He
<sup>+</sup>
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ion irradiation does not significantly modify the surface of the CoPt film: the roughness almost remains identical (∼2 nm). This is promising for applications in magnetic recording technologies.</div>
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